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Tanner L-Edit IC

物理设计与验证

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An AMS IC physical design environment from Siemens Digital Industries Software Benefits    •Complete hierarchical physical layout including all-angle and curved polygons    •Fast rendering    •Reads and writes OpenAccess with multi-user support    •Schematic Driven Layout (SDL) that imports netlists and automatically generates parameterized cells and instances them into your design    •Import Cadence Virtuoso technology and display files    •Interactive (real-time) DRC displays violations as you edit    •Cross-probe between schematic, layout and LVS report to highlight nets or devices    •Node highlighting for connectivity visualization    •Object snapping (gravity) for quick, accurate layout    •Increase routing productivity with automated instancing of parameterized cells, real-time net flylines, net completion tracking, geometry marking/highlighting/by net and ECO tracking    •Pad I/O cross reference for easy generation of bonding reports    • Platform independence on Windows or Linux    • Ease of use: Intuitive and quick learning curve    • Unparalleled customer support    • Flexible licensing
Tanner S-Edit Schematic Capture

物理设计与验证

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Siemens Digital Industries Software helps speed up mixed-signal IC design capture Benefits•Handles your most complex, full-custom IC schematic capture•Integration with AFS. Symphony, and Eldo simulators, allowing waveform cross-probing and direct viewing of operating point simulation results in the schematic•Export formats: SPICE, EDIF, Verilog and VHDL•Import formats: Native OpenAccess, EDIF, SPICE and Verilog•Support for inherited connections•Cross-probe between schematic, layout and Calibre LVS report with net/device highlighting•Configurable schematic Electrical Rule Checks (ERC)•Multiple-views per cell including: SPICE, schematic, Verilog, Verilog-A and Verilog-AMS views•Advanced array and bus support•Integrated with Tanner L-Edit Schematic Driven Layout (SDL) module to speed the layout and ECO process• Multiple library support with integrated library browser• Fully scriptable and expandable using TCL/Tk command language• Offers easy interoperability with third-party tools and foundry PDKs• Platform independence on Windows or Linux• Ease of use: intuitive and quick learning curve• Unparalleled customer support• Flexible licensing
Tanner MEMS Design Flow

物理设计与验证

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Features and benefits    •A complete 3D MEMS and IC design solution in one unified environment    •25 years’ experience with MEMS tools    •Create a MEMS 3D model from layout    •Highly programmable layout editor with MEMS-friendly capabilities, such as curved polygons    •Parameterized layout generators help create complex MEMS structures    •Complete layer and design geometry visualization    •Easily create, place and align MEMS structures with the alignment toolbar or the L Comp composition library    •Design Rule Checking (DRC) for MEMS manufacturability    •Import DXF with boundary reconstruction and export DXF    •SoftMEMS Tools Upgrade Option:        –Advanced 3D analysis tools: mechanical, thermal, acoustic, electrical, electrostatic, magnetic and fluidic analysis        –System-level simulation, co-simulation of IC design and MEMS device        –Automatically generate behavioral models of MEMS device from 3D analysis results    •Platform independence on Windows or Linux    •Ease of use: intuitive and short learning curve    •Unparalleled customer support    •Flexible licensing
Tanner L-Edit Photonics

物理设计与验证

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Benefits•Supports Siemens PDKs and iPDKs•Supports interoperability with 3rd-party IP•Complete, hierarchical physical layout editor•Standard interface to Calibre physical verification tools•Supports curved polygons and all-angle geometries•Fast rendering•Object snapping (gravity) for quick, accurate layout•Platform independence with Windows and Linux support•Ease of use: intuitive and quick learning curvePhotonic-specific benefits    •Supports production-level photonic design    •Layout-centric flow with built-in netlisting    •Waveguide generation and editing:        –Waveguide length editing        –Multiple waveguide types        –Waveguide crossing insertion    •PDKs available from multiple photonic foundries    •Supports multiple photonics simulators
Tanner L-Edit MEMS Plus

物理设计与验证

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Tanner L-Edit MEMS，它是一种高级版图编辑器，具有曲面多边形和任意角度布尔运算等能够支持 MEMS 版图设计的功能。与其他专为机械工程而设计的 CAD 工具不同，L-Edit MEMS 可显示掩膜的 Clear 和 Dark 区域。因此，您可以快速绘制和编辑掩膜，然后轻松查看不同的掩膜组合，以检查它们的重叠和交互情况。利用众多强大的功能，例如出色的曲线支持、交互式 DRC、布尔运算、对象捕捉和对齐，您可以更高效地开展工作，以节省时间和成本。L-Edit MEMS 支持对任意形状、任意曲线的多边形执行复杂的布尔运算和派生层操作，提供了更高的精度。可针对对象组执行 AND、OR、XOR、减法、扩展和收缩等运算和操作。这样，只需要几个轻松绘制的对象，便可快速创建完整、复杂的 MEMS 曲面图形。
Tanner S-Edit

物理设计与验证

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Tanner S-Edit 是一个面向原理图输入和设计的易于使用的开发环境。它为您提供处理最复杂的混合信号 IC 设计所需的功能。S-Edit 与 Tanner T-Spice、Analog FastSPICE™ (AFS) 或 Eldo® 仿真器、Tanner™ L-Edit IC 版图工具以及 Calibre® LVS 和 PEX 工具紧密集成。S-Edit 可通过优化提高您的生产率并加速概念到芯片的转换，帮助您满足当今快节奏的市场需求。更快的设计周期使您可以更灵活地转向优化的解决方案，为工艺角验证腾出更多的时间和资源。最终可降低下游风险，提高良率并缩短上市时间。

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